Wireless Infrastructure
Meeting the continually evolving demands for 4G LTE & 5G wireless infrastructure applications with RFHIC's gallium nitride (GaN) on silicon carbide (SiC) technology solutions
RFHIC’s IE21085P is a discrete gallium nitride on silicon carbide (GaN-on-SiC) high-electron-mobility transistor (HEMT) which operates from 2110 to 2170 MHz. The IE21085P delivers 85 W of saturated power at 48V with a drain efficiency of 43% at Psat. The device is a single-stage internally matched power amplifier transistor packaged in our NS-AS01 ceramic package. The IE21085P can be used in Doherty architecture for the final stage of a base station power amplifier for WiMAX, LTE, and GSM systems.
View Product Specification| Max Freq. | 2170MHz |
|---|---|
| Typ Output Power | 19W |
| Saturation Power | 85W |
| Power Gain | 21dB |
| Efficiency | 43% |
| VDC | 46 |
| Package | NS-AS01 |
| Package Type | Flange |
| Min Freq2. | 2110MHz |