Wireless Infrastructure
Meeting the continually evolving demands for 4G LTE & 5G wireless infrastructure applications with RFHIC's gallium nitride (GaN) on silicon carbide (SiC) technology solutions

RFHIC’s IE08220P is a discrete gallium nitride on silicon carbide (GaN-on-SiC) high-electron-mobility transistor (HEMT) which operates from 758 to 858 MHz. The IE08220P delivers 240 W of saturated power at 48V with a drain efficiency of 75% at Psat. The device is a single-stage internally matched power amplifier transistor packaged in our NS-AS01 ceramic package. The IE08220P can be used in Doherty architecture for the final stage of a base station power amplifier for WiMAX, LTE, and GSM systems.
View Product SpecificationMax Freq. | 858MHz |
---|---|
Typ Output Power | 50W |
Saturation Power | 240W |
Power Gain | 22dB |
Efficiency | 39% |
VDC | 48 |
Package | NS-AS01 |
Package Type | Flange |
Min Freq2. | 758MHz |