Wireless Infrastructure
Meeting the continually evolving demands for 4G LTE & 5G wireless infrastructure applications with RFHIC's gallium nitride (GaN) on silicon carbide (SiC) technology solutions

RFHIC’s IE18165P is a discrete gallium nitride on silicon carbide (GaN-on-SiC) high-electron-mobility transistor (HEMT) which operates from 1805 to 1880 MHz.The IE18165P delivers 170 W of saturated power at 48V with a drain efficiency of 39% at Psat. The device is a single-stage internally matched power amplifier transistor packaged in our NS-AS01 ceramic package. The IE18165P can be used in Doherty architecture for the final stage of a base station power amplifier for WiMAX, LTE, and GSM systems.
View Product SpecificationMax Freq. | 1880MHz |
---|---|
Typ Output Power | 37W |
Saturation Power | 170W |
Power Gain | 18.3dB |
Efficiency | 39% |
VDC | 48 |
Package | NS-AS01 |
Package Type | Flange |
Min Freq2. | 1805MHz |