Wireless Infrastructure
Meeting the continually evolving demands for 4G LTE & 5G wireless infrastructure applications with RFHIC's gallium nitride (GaN) on silicon carbide (SiC) technology solutions
RFHIC’s IE21110P is a discrete gallium nitride (GaN) on silicon carbide (SiC) high-electron-mobility (HEMT) which operates from 2110 to 2170 MHz. The IE21110P delivers 110 W of saturated power at 48V with a drain efficiency of 74% at Psat. The device is a single-stage internally matched power amplifier transistor, packaged in our NS-AS01 ceramic package. The IE21110P can be used in Doherty architecture for the final stage of a base station power amplifier for WiMAX, LTE, and GSM systems.
.
View Product Specification| Typ Output Power | 25W |
|---|---|
| VDC | 48 |
| Package | NS-AS01 |
| Package Type | Flange |